SEM Lithography System

System Component

SEM and Electron beam exposure pattern generator

Manufacturer of SEM

FEI company（USA）

Model of SEM

Quanta 200FEG

Specifications of SEM

1.0  nm at 30 KV (SE) in high vacuum

3.5 nm at 3 KV (SE) in high Vacuum

Accelerating voltage: 200V～30KV

Manufacturer of Electron-beam   exposure pattern generator

Raith (DE)

Model of Electron-beam   exposure pattern generator

ELPHY Quantum

Specifications of Electron-beam   exposure pattern generator

1. Scanning frequency: 6 MHz

2. Dwell time: 167 ns

3. Whitefield alignment: Hardware correction

Application and uses

The   main application of the system is for SEM lithography, The system can be   applied to the research of microelectronics, micromechanics, and micro/nano   optics.

Contact

Yujie Han

Tel.

65880320

E-mail

yjhan@suda.edu.cn