Instrument name | Magnetron Sputter |
Model | PVD75 |
Manufacturer | KURT J.LESKER COMPANY |
Specifications | 1.There are three sputtering targets with 2 diameter, and one of them could sputter ferro magnetic material. 2.Power Supply: RF and DC Power Supply 3.Shutter: There are 3 source shutter and 1 substrate shutter 4.Ultimate Vacuum: 5*10-5 Pa; Work Background Vacuum: 7*10-4 Pa； 5.Platen Size: Up to 4 diameter 6.Heating: ≤500 ℃ 7.System Control: PC+PLC Control |
Function and applications | Magnetron sputter is a universal metal coating machine, used for depositing of single-layer or multi-layer metal film. It could be mainly used for the metal, semiconductor, oxide et. al. electrodes preparation in the field of nano-device and organic photoelectric device. |
Accessories | Mechanical Pump |
Contacts: Wenchang Zhu | |
Contact number: 65881259 | |
E-mail: wczhu@suda.edu.cn | |
Editor: Wenchang Zhu