Mask Aligner
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Release time:2020-11-10
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Instrument name | Mask Aligner |
Model | MJB4 |
Manufacturer | SUSS Micro Tec Lithography GmbH |
Specifications |
Substrate Size：4” * 4” (100 mm) diameter substrate Substrate thickness: Up to 4 mm diameter Mask Size: from 2” * 2” to 5” * 5” Light Source: 500 W mercury lamp Support Constant Light Intensity or Constant Power Mode Resolution: Soft Contact Mode could realize 2 um structure Hard Contact Mode could realize 1 um structure Vacuum Contact Mode could realize 0.5 um structure |
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Applications and Uses
| The machine is exclusively intended for use as an alignment and /or exposure device for substrates used in semiconductor and micro system technology. |
Accessories | Damping workbench |
Contact | Wenchang Zhu |
| Tel | 15301453461 |
E-mail | wczhu@suda.edu.cn |
Editor: Wenchang Zhu
