Reactive Ion Etcher (RIE)

Instrument   name

Reactive Ion Etcher (RIE)

Model

Plasmalab 80plus RIE

Manufacturer

Oxford   Instruments

Specifications

1.Etching   Materials: Si, SiO2, Si3N4

2.Sample   Size: Maximum Size 200 mm

3.RF   Power: Frequency 13.56 MHZ, Power Adjust Range is 0-600 W

4. Gas   Supply: include CF4, CHF3, SF6, N2, He, O2, Ar etc.

5.Control   System: PC+PLC Control

Function   and applications

Reactive   ion etching (RIE) machine is mostly used in the field of fabrication of   micro/nano device. Our RIE instrument could etched Si, SiO2 and Si3N4.

Accessories

Dry   Pump

Contacts: Wenchang Zhu

Contact   number: 65881259

E-mail: wczhu@suda.edu.cn