题目：

Profound Effect of Substrate Hydroxylation and Hydration on Electronic and Optical Properties of Monolayer MoS₂

作者：

Changxi Zheng,^†,‡ Zai-Quan Xu,^§ Qianhui Zhang,^‡ Mark T. Edmonds,^† Kenji Watanabe,^∥ Takashi Taniguchi,^∥ Qiaoliang Bao, ^⊥,§ and Michael S. Fuhrer^*,†

单位：

^†School of Physics,‡Department of Civil Engineering, and  ^§Department of Materials Science and Engineering, Monash University,Clayton, Victoria 3800 Australia 

^∥National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan  ^⊥Institute of Functional Nano and Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices, and Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou 215123,People’s Republic of China

摘要：

Atomic force microscopy, Kelvin probe force microscopy, and scanning photoluminescence spectroscopy image the progressive post growth hydroxylation and hydration of atomically flat Al2O3(0001) under monolayer MoS2,manifested in large work function shifts (100 mV) due to charge transfer (>10¹³cm−2) from the substrate and changes in PL intensity, energy, and peak width. In contrast, trapped water between exfoliated graphene and Al2O3(0001) causes surface potential and doping changes one and two orders of magnitude smaller, respectively, and MoS2 grown on hydrophobic hexagonal boron nitride is unaffected by water exposure.

影响因子：

12.940 

分区情况：

1区

链接：

http://pubs.acs.org/doi/abs/10.1021/acs.nanolett.5b00098