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迟力峰教授课题组在Adv. Electron. Mater.上发表文章
发布时间:2017-08-30 点击:1049

题目:

High-Performance Bottom-Contact Organic Thin-Film Transistors by Improving the Lateral Contact


作者:

Xiaodong Zhang, Zi Wang, Xu Zhou, Zhifang Wang, Lizhen Huang,* and Lifeng Chi*


单位:

Institute of Functional Nano & Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials & Devices Soochow University, Renai Road 199, Suzhou 215123, China


摘要:

One of the main challenges to achieve high-performance bottom-contact transistors involves the organic/electrodes contacts. This study provides a simple approach to address the contact issue by incorporating an inducing layer prior to the organic semiconductor deposition. The molecules of the inducing layer nucleate into lamellar grains from the edge to the channel, resulting in a good morphological contact to the bottom electrodes. The following active layer maintains nearly layer-by-layer growth mode and yields uniformed terraced-like films both on the electrode edges and in the channels. With the inducing layer, pentacene thin-film bottom-contact transistors are obtained with a hole mobility exceeding 1 cm2 V1 s1.


影响因子:

4.193


分区情况:

新期刊


链接:

http://onlinelibrary.wiley.com/doi/10.1002/aelm.201700128/full#references


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