Abstract

Development of high-performance organic electronic and optoelectronicdevices relies on high-quality semiconducting crystals that have outstandingcharge transport properties and long exciton diffusion length and lifetime. Toachieve integrated device applications, it is prerequisite to precisely locatethe organic semiconductor crystals (OSCCs) to form a specifically patternedstructure. Well-patterned OSCCs can notonly reduce leakage current andcross-talk between neighboring devices, but also facilely integrate with otherdevice elements and their corresponding interconnects. In this review, wesummary general strategies for the patterning of OSCCs and discuss theadvantages and limitations of different patterning methods. Discussion is focused on an advanced strategyfor the high-resolution and wafer-scale patterning of OSCC by surfacemicrostructure-assisted patterning method. Furthermore, we highlight the recentprogress on OSCC pattern-based integrated circuities. Finally, the researchchallenges and directions of this young field are also presented.