题目：

One-step synthesis of chlorinated graphene by plasma enhanced chemical vapor deposition

作者：

Liwei Fan, Hui Zhang, Pingping Zhang, Xuhui Sun*

单位：

Jiangsu Key Laboratory for Carbon-Based Functional Materials and Devices, Institute of Functional Nano & Soft Materials (FUNSOM),Soochow University, Suzhou 215123, China

摘要：

We developed an approach to synthesize the chlorinated single layer graphene (Cl-G) by one-step plasmaenhanced chemical vapor deposition. Copper foil was simply treated with hydrochloric acid and thenCuCl2formed on the surface was used as Cl source under the assistance of plasma treatment. Com-pared with other two-step methods by post plasma/photochemical treatment of CVD-grown single layergraphene (SLG), one-step Cl-G synthesis approach is quite straightforward and effective. X-ray photo-electron spectroscopy (XPS) revealed that ∼2.45 atom% Cl remained in SLG. Compared with the pristineSLG, the obvious blue shifts of G band and 2D band along with the appearance of D’ band and D + G bandin the Raman spectra indicate p-type doping of Cl-G.

影响因子：

2.538

分区情况：

2区

链接：

http://www.sciencedirect.com/science/article/pii/S0169433215010053