题目：

Local-Curvature-Controlled Non-Epitaxial Growth of Hierarchical Nanostructures

作者：

Chaoran Li,¹ Shumin Zhang,¹Bingchang Zhang,¹ Jingjing Liu,¹ Weihu Zhang,¹ Alexander A. Solovev,³ Rujun Tang,²   Feng Bao,¹ Jia Yu,¹ Qiao Zhang,¹ Yeshayahu   Lifshitz,*^1,4 Le He,*¹ and Xiaohong Zhang*¹

单位：

¹Institute of Functional Nano & Soft Materials (FUNSOM), Jiangsu Key Laboratory for Carbon-Based Functional Materials & Devices, Soochow University 199 Ren’ai Road, Suzhou, 215123, Jiangsu   (PR China)

²Jiangsu Key Laboratory of Thin Films College of Physics, Optoelectronics and Energy Soochow University, Suzhou, 215006, Jiangsu (PR China)

³Department of Materials Science, Fudan University 220 Handan Road, 200433, Shanghai (PR China)

⁴Department of Materials Science and Engineering Technion—Israel Institute of Technology Haifa 3200003   (Israel)

摘要：

Site-selective growth on non-spherical seeds provides an indispensable route to hierarchical complex nanostructures that are interesting for diverse applications. However, this has only been achieved through epitaxial growth, which is restricted to crystalline materials with similar crystal structures and physicochemical properties. A non-epitaxial growth strategy is reported for hierarchical nanostructures, where site-selective growth is controlled by the curvature of non-spherical seeds. This strategy is effective for site-selective growth of silica nanorods from  non-spherical seeds of different shapes and materials, such as a-Fe₂O₃, NaYF₄, and ZnO. This growth strategy is not limited by the stringent requirements of epitaxy and is thus a versatile general method suitable for the preparation of hierarchical nanostructures with controlled morphologies and compositions to open up a verity of applications in self-assembly, nanorobotics, catalysis, electronics, and biotechnology.

影响因子：

11.994

分区情况：

一区

链接：

http://onlinelibrary.wiley.com/doi/10.1002/anie.201713185/pdf